Researchers
Name (Institute) |
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| Specialty | Semiconductor (doping process, characterization and micro fabrication), Surface Science (Scanning Probe Microscope) | ||||
| Science Interest (Past) |
MBE(Molecular Beam Epitaxy) of IV group semiconductor and its characterization,
SPM(Scanning Probe Microscope) of semiconductor surfaces such as Si(001)2x1, Si(111)7x7, Bi nanolines on Si(001), Mn wires on Si(001), Si(001):O, Si(110)2x16 and etc., Plasmonic Photo Reactor/ Biosensor with use of Au nanoparticles 2D arrays on ITO, Si, or Glasses, and their related researches. |
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| Science Interest (Current) |
MBE(Molecular Beam Epitaxy) of IV group semiconductor and its characterization,
SPM(Scanning Probe Microscope) of semiconductor surfaces such as Si(001)2x1, Si(111)7x7, Bi nanolines on Si(001), Mn wires on Si(001), Si(001):O, Si(110)2x16 and etc., Research on heavy metal doping processes in Si(001), also on dopants in wide gap semiconductors, and their related characterizations, including XAFS, Fluorescence X-ray hologram, Positron diffraction (TRHEPD) with using Synchrotron radiation facilities. |
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| Science Interest (Future) |
As like the present interests. | ||||
| Website / Contact | http://www.eng.u-hyogo.ac.jp/outline/faculty/miki/index.html |
